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直流GIS/GIL绝缘气固界面电荷积聚特性与调控研究进展(二):表面改性方法
更新时间:2026-10-20
    • 直流GIS/GIL绝缘气固界面电荷积聚特性与调控研究进展(二):表面改性方法

    • Vol. 52, Issue 8, Pages: 3469-3489(2026)
    • DOI:10.13336/j.1003-6520.hve.20251709    

      CLC:
    • Received:31 August 2026,

      Published:2026

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  • DING Lijian, WU Zecheng, XING Bowen, et al. 直流GIS/GIL绝缘气固界面电荷积聚特性与调控研究进展(二):表面改性方法[J]. 2026, 52(8): 3469-3489. DOI: 10.13336/j.1003-6520.hve.20251709.

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