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直流GIS/GIL绝缘气固界面电荷积聚特性与调控研究进展(一):电荷积聚主导机理
更新时间:2026-10-20
    • 直流GIS/GIL绝缘气固界面电荷积聚特性与调控研究进展(一):电荷积聚主导机理

    • Vol. 52, Issue 5, Pages: 2017-2038(2026)
    • DOI:10.13336/j.1003-6520.hve.20251708    

      CLC:
    • Received:31 May 2026,

      Published:2026

    移动端阅览

  • DING Lijian, WU Zecheng, XING Bowen, et al. 直流GIS/GIL绝缘气固界面电荷积聚特性与调控研究进展(一):电荷积聚主导机理[J]. 2026, 52(5): 2017-2038. DOI: 10.13336/j.1003-6520.hve.20251708.

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